Question

What is the advantage of using Ion implantation process?

(a) Lateral spreading is more

(b) Performed at high temperature

(c) Beam current controlled from outside

(d) Performed at low temperature

The question was posed to me during an online exam.

I'm obligated to ask this question of Basic Planar Process in division IC Fabrication of Linear Integrated Circuits

Answer 1

The correct answer is (c) Beam current controlled from outside

Illuminate the topic with: In diffusion process, temperature has to be controlled over a large area inside the oven, whereas in ion implantation technique, accelerating potential and the beam current are electrically controlled from outside.