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Find the coating material used for photo etching process along with its thickness range.

(a) Kodak photoresist (5000-10000Å)

(b) Kodak photoresist (1000-5000Å)

(c) Kodak photo etchant (1000-5000 Å)

(d) Kodak photo etchant (500-1000 Å)

I had been asked this question by my college director while I was bunking the class.

This question is from Basic Planar Process in section IC Fabrication of Linear Integrated Circuits

1 Answer

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by (39.8k points)
Right choice is (a) Kodak photoresist (5000-10000Å)

Discover the easiest explanation: The coating material is Kodak photoresist. It is a photosensitive emulsion film coated on wafer to remove SiO2 from desired region.

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