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Which of the following is added as an impurity to...

Which of the following is added as an impurity to p-type material in diffusion process?

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asked Jan 13 in Linear Integrated Circuits by Julian (37.1k points)

Which of the following is added as an impurity to p-type material in diffusion process?

(a) Phosphorous pentaoxide (P2O5)

(b) Phosphorous oxychloride (POcl3)

(c) Boron oxide (B2O3)

(d) None of the mentioned

This question was addressed to me at a job interview.

The origin of the question is Basic Planar Process in portion IC Fabrication of Linear Integrated Circuits

linear integrated circuits
ic fabrication
basic planar process

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1 Answer

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answered Mar 15 by Chris (39.8k points)

The correct answer is (c) Boron oxide (B2O3)

In simpler terms: Boron is a p-type material, whereas Phosphorous is an n-type material.

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