Question

Mention the technique used in photolithography process

(a) X-ray lithographic technique

(b) Ultraviolet lithographic technique

(c) Electron beam lithographic technique

(d) All of the mentioned

I had been asked this question in an interview for internship.

The question is from IC Chip Size and Circuit Complexity topic in portion IC Fabrication of Linear Integrated Circuits

Answer 1

The accurate option is (d) All of the mentioned

Illuminate the topic with: All these techniques are used to produce device dimension as small as 2µm or even down to sub micron range (<1µm).