The accurate option is (a) A low resistivity current path from n-type layer to n^+ contact layer
To put it plainly: A heavily doped n^+ region is sandwiched between the n-type epitaxial collector and p-type substrate. This buried n^+ region provide a low resistivity current path from active collector region (n-type layer) to the collector contact (n^+ contact layer). In effect, the n^+ layer shunt n-layer of collector region with respect to flow of current, thus effectively reduces the collector resistance.