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In Plasma Enhanced Chemical Vapor Deposition, deposition occurs at a _______ temperature.

(a) Higher

(b) Constant

(c) Increasing

(d) Lower

This question was addressed to me by my college director while I was bunking the class.

My enquiry is from Blending and Vapor Deposition in Thermoplastics topic in section Thermoplastic Polymers Properties & Processing of Food Packaging Technology

1 Answer

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Best answer
The correct answer is (d) Lower

Explanation: In Plasma Enhanced Chemical Vapor Deposition, deposition occurs at a low temperature. The use of plasma helps to deposit thin films from a gaseous state to a solid state on the substrate; hence it enhances chemical reaction rates. The plasma is created by alternating or direct current discharge between two electrodes. The space between electrodes is filled with reacting gases which contains reactive ions and radicals.

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